Conferencia

Estamos trabajando para incorporar este artículo al repositorio
Consulte el artículo en la página del editor
Consulte la política de Acceso Abierto del editor

Abstract:

The retention time of the resistive state is a key parameter that characterizes the possible utilization of the RRAM devices as a non - volatile memory device. The understanding of the mechanism of the time relaxation process of the information state may be essential to improve their performances. In this study we examine RRAM devices based on metal / YBCO interfaces in order to comprehend the physics beneath the resistive switching phenomenon. Our experimental results show that after producing the switching of the resistance from a low to a high state, or vice versa, the resistance evolves to its previous state in a small but noticeable percentage. We have measured long relaxation effects on the resistance state of devices composed by metal (Au, Pt) / ceramic YBCO interfaces in the temperature range 77 K - 300 K. This time relaxation can be described by a stretched exponential law that is characterized by a power exponent n = 0.5, which is temperature independent, and by a relaxation time τ that increases with increasing the temperature. These characteristics point out to a non-thermally assisted diffusion process that could be associated with oxygen (or vacancy) migration and that produces the growth of a conducting (or insulating) fractal structure. © 2011 Materials Research Society.

Registro:

Documento: Conferencia
Título:Retentivity of RRAM devices based on metal/YBCO interfaces
Autor:Schulman, A.; Acha, C.
Ciudad:San Francisco, CA
Filiación:Departamento de Física, FCEyN, Universidad de Buenos Aires, Pabellón 1, Ciudad Universitaria, C1428EHA Buenos Aires, Argentina
IFOBA, CONICET, Argentina
Palabras clave:Characteristics points; Diffusion process; Fractal structures; Information state; Key parameters; Power exponent; Relaxation effect; Resistance state; Resistive state; Resistive switching; Retention time; Stretched exponential law; Temperature range; Volatile memory; Functional materials; Interfaces (materials); Memory architecture; Platinum; Random access storage; Trees (mathematics); Yttrium barium copper oxides; Equipment
Año:2011
Volumen:1337
Página de inicio:103
Página de fin:107
DOI: http://dx.doi.org/10.1557/opl.2011.987
Título revista:2011 MRS Spring Meeting
Título revista abreviado:Mater Res Soc Symp Proc
ISSN:02729172
CODEN:MRSPD
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_02729172_v1337_n_p103_Schulman

Referencias:

  • Burr, G.W., Kurdi, B.N., Scott, J.C., Lam, C.H., Gopalakrishnan, K., Shenoy, R.S., (2008) IBM J. Res. & Dev., 52, p. 449
  • Waser, R., Aono, M., (2007) Nature Materials, 6, p. 833
  • Sawa, A., (2008) Materials Today, 11, p. 28
  • Porcar, L., Bourgault, D., Tournier, R., Barbut, J.M., Barrault, M., Germi, P., (1997) Physica C, 275, p. 1997
  • Acha, C., Rozenberg, M.J., (2009) J. Phys.: Condens, Matter, 21, p. 045702
  • Acha, C., (2009) Physica B, 404, p. 2746
  • Nian, Y.B., Strozier, J., Wu, N.J., Chen, X., Ignatiev, A., (2007) Phys. Rev. Lett., 98, p. 146403
  • Avrami, M., (1940) J. Chem. Phys., 8, p. 212
  • http://en.wikipedia.org/wiki/List_of_fractals_by_Hausdorff_dimension, See, for example; Li, T., Zhang, X.H., Zhu, Y.G., Huang, X., Han, L.F., Shang, X.J., Ni, H.Q., Niu, Z.C., (2010) Physica E, 42, p. 1597

Citas:

---------- APA ----------
Schulman, A. & Acha, C. (2011) . Retentivity of RRAM devices based on metal/YBCO interfaces. 2011 MRS Spring Meeting, 1337, 103-107.
http://dx.doi.org/10.1557/opl.2011.987
---------- CHICAGO ----------
Schulman, A., Acha, C. "Retentivity of RRAM devices based on metal/YBCO interfaces" . 2011 MRS Spring Meeting 1337 (2011) : 103-107.
http://dx.doi.org/10.1557/opl.2011.987
---------- MLA ----------
Schulman, A., Acha, C. "Retentivity of RRAM devices based on metal/YBCO interfaces" . 2011 MRS Spring Meeting, vol. 1337, 2011, pp. 103-107.
http://dx.doi.org/10.1557/opl.2011.987
---------- VANCOUVER ----------
Schulman, A., Acha, C. Retentivity of RRAM devices based on metal/YBCO interfaces. Mater Res Soc Symp Proc. 2011;1337:103-107.
http://dx.doi.org/10.1557/opl.2011.987