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Capeluto, M.G.; Vaschenko, G.; Grisham, M.; Marconi, M.C.; Ludueña, S.; Pietrasanta, L.; Lu, Y.; Parkinson, B.; Menoni, C.S.; Rocca, J.J. "Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser" (2006) IEEE Transactions on Nanotechnology. 5(1):3-6
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Abstract:

We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications. © 2006 IEEE.

Registro:

Documento: Artículo
Título:Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
Autor:Capeluto, M.G.; Vaschenko, G.; Grisham, M.; Marconi, M.C.; Ludueña, S.; Pietrasanta, L.; Lu, Y.; Parkinson, B.; Menoni, C.S.; Rocca, J.J.
Filiación:IEEE, Argentina
Departamento de Física, Universidad de Buenos Aires, C1428EHA Buenos Aires, Argentina
National Science Foundation ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80521, United States
National Science Foundation ERC for Extreme Ultraviolet Science and Technology, United States
Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80521, United States
Facultad de Ciencias Exactas, Centro de Microscopias Avanzadas, Universidad de Buenos Aires, C1428EHA Buenos Aires, Argentina
Department of Chemistry, Colorado State University, Fort Collins, CO 80521, United States
National Science Foundation (NSF), Engineering Research Center for EUV Science and Technology, Colorado State University, Fort Collins, United States
Electrical and Computer Engineering Department, Colorado State University, Fort Collins, United States
National Science Foundation (NSF), Engineering Research Center for EUV Science and Technology, Colorado State University, United States
Optical Society of America (OSA), United States
Argentinean Physical Society
Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, United States
American Physical Society, Optical Society of America (OPS), United States
Palabras clave:Nanotechnology; Photolithography; X-ray lasers; X-ray lithography; EUV lasers; X-ray lasers; X-ray lithography; Interferometry; Lasers; Nanotechnology; Pattern recognition; Polymethyl methacrylates; Ultraviolet radiation; Photolithography
Año:2006
Volumen:5
Número:1
Página de inicio:3
Página de fin:6
DOI: http://dx.doi.org/10.1109/TNANO.2005.858599
Título revista:IEEE Transactions on Nanotechnology
Título revista abreviado:IEEE Trans. Nanotechnol.
ISSN:1536125X
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_1536125X_v5_n1_p3_Capeluto

Referencias:

  • Golovkina, V.N., Nealey, P.F., Cerrina, F., Taylor, J.W., Solak, H.H., David, C., Gobrecht, J., Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography (2004) J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., 22, pp. 99-103
  • Solak, H.H., He, D., Li, W., Gasson, S.S., Cerrina, S.S., Sohn, B.H., Yang, X.M., Nealey, P., Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography (1999) Appl. Phys. Lett., 75, pp. 2328-2330
  • Solak, H.H., He, D., Li, W., Cerrina, F., Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces (1999) J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., 17, pp. 3052-3057
  • Zaidi, S.H., Brueck, S.R.J., Multiple-exposure interferometric lithography (1993) J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., 11, pp. 658-666
  • Yu, Z., Wu, W., Chen, L., Chou, S., Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications (2001) J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., 19, pp. 2816-2819
  • Savas, T.A., Shah, S.N., Schattenburg, M.L., Carter, J.M., Smith, H.I., Achromatic interferometric lithography for 100-nm-period gratings and grids (1995) J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., 13, pp. 2732-2735
  • Switkes, M., Bloomstein, T.M., Rothschild, M., Patterning of sub-50 nm dense features with space-invariant 157 nm interference lithography (2000) Appl. Phys. Lett, 77, pp. 3149-3151
  • Hinsberg, W., Houle, F.A., Hoffnagle, J., Sanchez, M., Wallraff, G., Morrison, M., Frank, S., Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance (1998) J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., 16, pp. 3689-3694
  • Yen, A., Anderson, E., Ghanbari, R.A., Schattenburg, M., Smith, H., Achromatic holographic configuration for 100-nm-period lithography (1992) Appl. Opt., 31, pp. 4540-4545
  • Benware, B., Moreno, C., Burd, D., Rocca, J.J., Operation and output pulse characteristics of an extremely compact capillary-discharge tabletop soft-X-ray laser (1997) Opt. Lett., 22, pp. 796-798
  • Macchietto, C.D., Benware, B.R., Rocca, J.J., Generation of millijoule-level soft-X-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier (1999) Opt. Lett., 24, pp. 1115-1117
  • Born, M., Wolf, E., (1999) Principles of Optics, 7th Ed., , Cambridge, U.K.: Cambridge Univ. Press
  • Goodman, J.W., (1985) Statistical Optics, pp. 171-187. , New York: Wiley
  • Liu, Y., Seminario, M., Tomasel, F.G., Chang, C., Rocca, J.J., Attwood, D.T., Achievement of essentially full spatial coherence in a high-average-power soft-X-ray laser (2001) Phys. Rev A, Gen. Phys., 63. , Art. 033 802
  • Luther, B.M., Wang, Y., Larotonda, M.A., Alessi, D., Berrill, M., Marconi, M.C., Rocca, J.J., Shlyaptsev, V.N., Saturated high-repetition-rate 18.9-nm tabletop laser in nickellike molybdenum (2005) Opt. Lett., 30, pp. 165-167
  • Wang, Y., Larotonda, M.A., Luther, B.M., Alessi, D., Berril, M., Shlyaptsev, V.N., Rocca, J.J., Demonstration of high repetition rate tabletop soft X-ray lasers with saturated output at wavelengths down to 13.9 nm and gain down to 10.9 nm Phys. Rev. Lett., , submitted for publication
  • Keenan, R., Dunn, J., Patel, P.K., Price, D.F., Smith, R.F., Shlyaptsev, V.N., High-repetition-rate grazing-incidence pumped X-ray laser operating at 18.9 nm (2005) Phys. Rev. Lett., 94. , Art. 103 901
  • Jacobsen, C., Howells, M., A Technique for projection X-ray lithograpy using computer generated holograms (1992) J. Appl. Phys., 71, pp. 2993-3001
  • Biswas, A., Brueck, S.R.J., Simulation of the 45-nm half-pitch node with 193-nm immersion lithography - Imaging interferometric lithography and dipole illumination (2004) J. Microlith., Microfab., Microsyst., 3, pp. 35-43

Citas:

---------- APA ----------
Capeluto, M.G., Vaschenko, G., Grisham, M., Marconi, M.C., Ludueña, S., Pietrasanta, L., Lu, Y.,..., Rocca, J.J. (2006) . Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser. IEEE Transactions on Nanotechnology, 5(1), 3-6.
http://dx.doi.org/10.1109/TNANO.2005.858599
---------- CHICAGO ----------
Capeluto, M.G., Vaschenko, G., Grisham, M., Marconi, M.C., Ludueña, S., Pietrasanta, L., et al. "Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser" . IEEE Transactions on Nanotechnology 5, no. 1 (2006) : 3-6.
http://dx.doi.org/10.1109/TNANO.2005.858599
---------- MLA ----------
Capeluto, M.G., Vaschenko, G., Grisham, M., Marconi, M.C., Ludueña, S., Pietrasanta, L., et al. "Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser" . IEEE Transactions on Nanotechnology, vol. 5, no. 1, 2006, pp. 3-6.
http://dx.doi.org/10.1109/TNANO.2005.858599
---------- VANCOUVER ----------
Capeluto, M.G., Vaschenko, G., Grisham, M., Marconi, M.C., Ludueña, S., Pietrasanta, L., et al. Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser. IEEE Trans. Nanotechnol. 2006;5(1):3-6.
http://dx.doi.org/10.1109/TNANO.2005.858599