Conferencia

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Abstract:

We present the design of phase shift interferometer for the extreme ultraviolet (EUV) that will be used with the illumination provided by a table top Ne-like Ar laser emitting at 46.9 nm. We develop a model that computes the beam propagation trough the instrument, taking into account the influence of the fluctuations from shot-to-shot of the pulsed EUV laser on the retrieved wavefront.

Registro:

Documento: Conferencia
Título:Design of a phase shifting interferometer in the EUV for high precision metrology
Autor:Capeluto, M.G.; Marconi, M.C.; Iemmi, C.
Filiación:Departamento de Física J.J.Giambiagi, Facultad de Ciencias Exactas Y Naturales, Universidad de Buenos Aires, 1426 Buenos Aires, Argentina
NSF ERC for Extreme Ultraviolet Science and Technology, Department of Electrical and Computer Engineering, Colorado State University, United States
Palabras clave:Argon lasers; Extreme ultraviolet lithography; Interferometers; Pulsed lasers; Ar-laser; EUV lasers; Extreme ultraviolets; High-precision; Ne-like; Phase-shift interferometer; Phase-shifting interferometers; Table-top; Phase shift
Año:2011
Volumen:274
Número:1
DOI: http://dx.doi.org/10.1088/1742-6596/274/1/012026
Título revista:Journal of Physics: Conference Series
Título revista abreviado:J. Phys. Conf. Ser.
ISSN:17426588
PDF:https://bibliotecadigital.exactas.uba.ar/download/paper/paper_17426588_v274_n1_p_Capeluto.pdf
Registro:https://bibliotecadigital.exactas.uba.ar/collection/paper/document/paper_17426588_v274_n1_p_Capeluto

Referencias:

  • Rocca, J.J., (1999) Review of Scientific Instruments, 70, pp. 3799-3827
  • Alman, D.A., Qiu, H., Spila, T., Thompson, K.C., Antonsen, E.L., Jurczyk, B.E., Ruzic, D.N., (2007) Journal of Micro/Nanolithography, MEMS, and MOEMS, 6, p. 013006
  • Juha, L., Bittner, M., Chvostova, D., Krasa, J., Otcenasek, Z., Präg, A.R., (2005) Applied Physics Letters, 86, p. 034109
  • Attwood, D.T., Sommargren, G.E., Beguiristain, R., Nguyen, K., Bokor, J., (1993) Applied Optics, 32, p. 7022
  • Medecki, H., Tejnil, E., Goldberg, K.A., Bokor, J., (1996) Optics Letters, 21, pp. 1526-1528
  • Sommargren, G.E., (1996) Optical Society of America Meeting on Extreme Ultraviolet Lithography
  • Sommargren, G.E., (1996) Laser Focus World, 32, pp. 61-67
  • Naulleau, P.P., Goldberg, K.A., Lee, S.H., Chang, C., Attwood, D., Bokor, (1999) J Applied Optics, 3, pp. 7252-7263
  • Kennedy, E.T., Costello, J.T., Mosnier, J.P., Van Kampen, P., (2004) Radiation Physics and Chemistry, 70, pp. 291-321
  • Hatano, Y., (2003) Radiation Physics and Chemistry, 67, pp. 187-198
  • Suzuki, T., (2006) 2006 Annual Review of Physical Chemistry, 57, pp. 555-592
  • Attwood, D.T., Anderson, E., Denbeaux, G., Goldberg, K., Naulleau, P., Schneider, G., (2002) X-Ray Lasers 2002 Lasers AIP Conf Proc, 641, pp. 461-468. , 2002
  • Filevich, J., Rocca, J.J., Marconi, M.C., Moon, S.J., Nilsen, J., Scofield, J.H., Dunn, J., Shlyaptsev, V.N., (2005) Phys Rev Lett, 94, p. 035005
  • Purvis, M.A., Grava, J., Filevich, J., Marconi, M.C., Dunn, J., Moon, S.J., Shlyaptsev, V.N., Rocca, J.J., (2008) IEEE Transactions on Plasma Science, 36, pp. 1134-1135
  • Shkolnikov, P.L., Kaplan, A.E., (1996) X-Ray Lasers, 1511, p. 512
  • Bjorkholm, J.E., Bokor, J., Freeman, R.R., Gregus, J., Jewell, T.E., Mansfield, W.M., MacDowell, A.A., Bruning, J.H., (1990) J Vac Sci Technol B, 8, pp. 1509-1513
  • Bjorkholm, J.E., MacDowell, A.A., Wood II, O.R., Tan, Z., LaFontaine, B., Tennant, D.M., (1995) J. Vac. Sci. Technol. B, 13, pp. 2919-2922
  • Rocca, J.J., Moreno, C.H., Marconi, M.C., Kanizay, K., (1999) Optics Letters, 24, pp. 420-422
  • Bruning, J.H., Herriott, D.R., Gallagher, J.E., Rosenfeld, D.P., White, A.D., Brangaccio, D.J., (1974) Appl Opt, 13, pp. 2693-2703
  • Creath, K., (1998) Chapter V: Phase-Measurment Interferometry Techniques in Progress in Optics XXVI, , Wolf editor (Amsterdam: Elsevier Science Publishers BV)
  • Rocca, J.J., Beethe, D.C., Marconi, M.C., (1988) Optics Letters, 13, pp. 565-567
  • Rocca, J.J., Shlyaptsev, V.N., Tomasel, F.G., Cortázar, O.D., Hartshom, D., Chilla, J.L., (1994) Physical Review Letters, 73, pp. 2192-2195
  • Martinez, O.E., (1986) Journal of the Optical Society of America B Optical Physics, 3, pp. 929-934

Citas:

---------- APA ----------
Capeluto, M.G., Marconi, M.C. & Iemmi, C. (2011) . Design of a phase shifting interferometer in the EUV for high precision metrology. Journal of Physics: Conference Series, 274(1).
http://dx.doi.org/10.1088/1742-6596/274/1/012026
---------- CHICAGO ----------
Capeluto, M.G., Marconi, M.C., Iemmi, C. "Design of a phase shifting interferometer in the EUV for high precision metrology" . Journal of Physics: Conference Series 274, no. 1 (2011).
http://dx.doi.org/10.1088/1742-6596/274/1/012026
---------- MLA ----------
Capeluto, M.G., Marconi, M.C., Iemmi, C. "Design of a phase shifting interferometer in the EUV for high precision metrology" . Journal of Physics: Conference Series, vol. 274, no. 1, 2011.
http://dx.doi.org/10.1088/1742-6596/274/1/012026
---------- VANCOUVER ----------
Capeluto, M.G., Marconi, M.C., Iemmi, C. Design of a phase shifting interferometer in the EUV for high precision metrology. J. Phys. Conf. Ser. 2011;274(1).
http://dx.doi.org/10.1088/1742-6596/274/1/012026